• WP1 "More Moore"
• WP2 "Beyond CMOS"
• WP3 "Joint Processing Platform"
• WP4 "Modelling and Characterization Platform"
• WP5 "Integration and Spreading of Excellence"

 

• SiNANO BOOK

 

• For the year 2010:

List of scientific publications and participations to conferences in the year 2010:
nanosil_publications_2010.pdf   

• For the year 2009:

List of scientific publications and participations to conferences in the year 2009:
nanosil_publications_2009.pdf

• For the year 2008:

- List of scientific publications and participations to conferences in the year 2008:

nanosil_publications_2008.pdf 

• Details of the joint publications with Nanosil aknowledgment:

	Publication
	Workpackage  :  WP1 - More Moore Type  :  Scientific Journal Title  :  Charging phenomena at the interface between high-k dielectrics and SiOx interlayers Title  :  J. Telecom. Inf. Tech., No. 1, 2010 Name(s) of participant(s) (conf) and Author(s) (papers)  :  O. Engström, B. Raeissi, J. Piscator, I.Z. Mitrovic, S. Hall, H.D.B. Gottlob, M. Schmidt, P.K. Hurley, K. Cherkaoui Year  :  2009 Permanent link  :  http://www.nit.eu/publ/jtit/searchresult.html?jezyk=en&czasopismo=2&rok=2010&nr_mies=1&no_nr=1&limit=100 Open Access provided  :  1 Key words  :  Summary  :  Relative task  :