Details of the joint publications with Nanosil aknowledgment:
Publication
Workpackage
:
WP4 - Joint Modelling and Characterisation Platform
Type
:
Scientific Journal
Title
:
Experimental and Theoretical Analysis of Hole Transport in Uniaxially Strained pMOSFETs
Title
:
Proc. ESSDERC 2008
Name(s) of participant(s) (conf) and Author(s) (papers)
:
K. Huet, M. Feraille, D. Rideau, R. Delamare, V. Aubry-Fortuna, M. Kasbari, S. Blayac, C. Rivero, A. Bournel, C. Tavernier, P. Dollfus, H. Jaouen
Number / period
:
-
Publisher
:
Institute of Physics
Year
:
2008
Relevant pages
:
pp. 234-237
Key words
:
Summary
:
Experimental and theoretical analysis of hole transport in uniaxially strained pMOSFETs
Huet, K. Feraille, M. Rideau, D. Delamare, R. Aubry-Fortuna, V. Kasbari, M. Blayac, S. Rivero, C. Bournel, A. Tavernier, C. Dollfus, P. Jaouen, H.
Inst. d'Electron. Fondamentale, Univ. Paris Sud, Orsay;
E-ISBN: 978-1-4244-2364-4
ISSN: 1930-8876
ISBN: 978-1-4244-2363-7
INSPEC Accession Number: 10394848
Digital Object Identifier: 10.1109/ESSDERC.2008.4681741
Current Version Published: 2008-11-18
Abstract
A new wafer bending experiment reports hole mobility variations in pMOS devices with uniaxial stress applied along the <110>, <-110> and <100> directions. Our results have been interpreted using Kubo-Greenwood (KG) formalism. Mobilities were calculated using the usual 3DHG KG formula, but also using a 2DHG calculation. The latter, that accounts for quantum confinement due to the transverse field, is based on a fully self-consistent Poisson-kp-Schrodinger scheme. This 2DHG approach appears to be mandatory for an accurate description of transport properties in strained inversion layers.